Time

Program

08:00-08:30

Registration

08:30-08:55

Technical Session: Process and Modeling
IT: Helmut Schift (Paul Scherrer Institut Villigen)

08:55-09:10

OT: Hiroshi HIROSHIMA (AIST)

09:10-09:25

OT: Kentaro ISHIBASHI (WASEDA University / Toshiba machine)

09:25-09:40

OT: Po Jin KIM (Pusan National Univ.)

09:40-09:55

OT: Seunghwa YANG (Seoul National Univ.)

09:55-10:15

Coffee Break / Poster Presentation

10:15-10:45

Plenary Speech: Shuichi Shoji (Waseda Univ.)

10:45-11:10

IT: Jouni Ahopeito (VTT Microsystems and Nanoelectronics)

11:10-11:25

OT: Sanghyeok KIM (KAIST)

11:25-11:40

OT: Jong-Ning AOH (National Chung Cheng Univ.)

11:40-11:55

OT: Hayden TAYLOR (Simprint Nanotechnologies)

11:55-12:10

OT: Thomas BU (Institut for Mikro-og Nanoteknologi)

12:10-12:25

OT: Jian HE Ge (SiM-Gesellschaft fuer Silizium-Mikrosysteme mbH)

12:25-13:30

Lunch

13:30-14:00

Plenary Speech: S.V.Sreenivasan (Molecular Imprints)

14:00-14:25

Technical Session: Application Ⅰ: Electronics/Magnetics, Optoelectronics / Optics and Photovoltaics
IT: Yoshihiro Uozu (Mitsubishi Rayon)

14:25-14:40

OT: Henry J. H. CHEN (National Chi Nan Univ.)

14:40-14:55

OT: Iris BERGMAIR (PROFACTOR GmbH)

14:55-15:10

OT: Shinill KANG (Yonsei Univ.)

15:10-15:35

IT: Marc Verschuuren (Philips Corporate Technologies)

15:35-15:50

OT: Joonam KIM (TIT)

15:50-16:05

OT: Youngtae CHO (Samsung electronics)

16:05-16:20

OT: Vaida AUZELYTE (EPFL)

16:20-18:20

Poster Presentation

18:20-21:00

Banquet